* a M5 line (26um wide, 1um thick) over Si substrate 8um below, sigma=2.6e7
* 430um thick substrate, sigma=1.5e4 1/(ohm*m)
* line length=1000um
.units uM
*
* Define substrate, sigma=1.5e4 1/(m*ohm)= 0.015 1/(um*ohm)
g1 x1 = -1500 y1 = -1500 z1 = 0
+  x2 = 1500  y2 = -1500 z2 = 0
+  x3 = 1500  y3 = 1500  z3 = 0
+  thick = 430  sigma= 0.015
*+  seg1 = 100 seg2 = 100
+ file=NONE 
*  under the trace
+ contact decay_rect (0,0,0,50,2000,13,3000,500,3000)
*  the contacts
+ contact decay_rect (0,-1000,0,30,30,10,10,3000,3000)
+ contact decay_rect (0, 1000,0,30,30,10,10,3000,3000)
+
+  nhinc = 3 rh=2
*     nodes to reference later:
+  np1 (0,-1000,0)
+  np2 (0,1000,0)
*
* line width=26um
* thick h=1um sigma=2.6e7 1/(m*ohm)=26 1/(um*ohm)
*
NS1 x=0 y=-1000 z=223.5
NS2 x=0 y=1000 z=223.5
EM5 NS1 NS2 w=26 h=1 sigma=26 nwinc=4 nhinc=1
.equiv NS2 np2 
.external NS1 np1
*
.freq fmin=3.3e8 fmax=3.3e8 ndec=1
.end